Multi-peak industrial interferometers for nanometer accuracy

Micro-Epsilon’s white light multi-peak industrial interferometers are indispensable when measuring distance and/or thickness of multiple thin transparent layers, substrates and coatings. Contactless and with unmatched accuracy, you can simultaneously measure distance and determine thickness of up to 13 layers.

Measure multiple layers in one measuring process

Micro-Epsilon has further developed its white light industrial interferoMETER range. Their interferoMETER Multi-Peak (MP) systems enable contactless high-resolution distance and thickness measurements of multiple transparent layers in just one measuring process.

The MP systems allow you the measurement of multiple layers, substrates and coatings that are transparent to the 840 nm wavelength range. In addition to their multi-peak design, the interferometers are equipped with new sensor housings in a higher protection class IP65 for industrial use.

All this opens up numerous new potential applications, particularly in the semiconductor industry, as well as in the production of coated glass, batteries and plastic/films.

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Exploit unmatched accuracy of multi-peak industrial interferometers

Multi-peak industrial interferometer Micro-Epsilon

The high-performance white light interferometers provide unmatched accuracy levels in absolute contactless optical distance and thickness measurement. Thanks to a resolution up to <30 picometers and excellent linearity, these interferometers represent a step change in accuracy from confocal measurement systems. Unlike traditional laser interferometers they operate with a broadband super-luminescent diode allowing for a greater overall measurement range. In addition, being in the near-IR part of the spectrum opens up the possibility to measure thicknesses of anti-reflective glass, plastics, reflective metals and coated objects.

The multi-peak versions now also enable high-precision detection of transparent layers. In systems for MP distance measurement distance and thickness measurements are carried out via calculations based on the respective distance values and taking the refractive indices into account. The MP thickness measuring system does not perform any distance measurements, it measures the thickness of the individual layers and their combinations.

Different Multi-peak systems for different tasks

Two main MP systems are available: for multi-peak distance measurement (IMS5x00-DS/MP) and multi-layer thickness measurement (IMS5400-TH/MP).

Systems for multi-peak distance measurement are particularly beneficial in alignment and positioning tasks in which a distance is to be measured and a thickness determined at the same time. In a large measuring range of 2.1 mm, up to 13 layers with minimum thicknesses of up to 10 µm can be detected. Thanks to the absolute measurement, the system does not have to be referenced even after a signal interruption, for example, at steps or edges.

Systems for multi-layer thickness measurement are always used when distance-independent thickness values for up to 5 layers are required. In the thickness measuring range of 4.2 mm or 7 mm, individual layers of up to 35 µm are measured in a process-stable manner. A large base distance of up to 70 mm offers process reliability and protects the sensor from damage.

Configure Multi-peak industrial interferometers with ease

Micro-Epsilon solution provides easy set up and configuration of MP interferometers via a modern, intuitive, integrated web interface.

For optimal integration of the interferometers into devices and systems, a wide range of interfaces is available:

digital interfaces (Ethernet / EtherCAT / RS422; optionally Profinet / EtherNet/IP),
encoder connections,
analog outputs,
synchronization outputs and digital I / O.

Also commissioning and parameterization are performed conveniently via web interface and do not require any software installation (watch the video).

Take advantage of simple alignment and fine adjustment

Sensor housings with a higher IP65 protection rating for industrial environments are available, as well as vacuum-compatible sensors, cables and feedthrough accessories for vacuum applications.

The adjustable JMA mounting adapter simplifies the alignment and fine adjustment of interferometric sensors. It enables easy and fast sensor integration into the machine and fine adjustment directly on site. This corrects, e.g, minor deviations caused by mounting and compensates for tilted measuring objects.

With two-sided thickness measurements, the JMA adapter supports the fine alignment of two measuring points. This avoids shifted measurements in order to achieve reliable measurements with the highest precision.

adjustable mounting adapter for MP interferometers

Choose the most suitable multi-peak interferoMETER model

Additionaly to the model IMS5400-TH for single-layer thickness measurements, and models IMS5400-DS and IMS5600-DS for single-layer distance measurements, Micro-Epsilon presents the following multi-peak models:

IMS5x00-DS/MP

Models IMS5400-DS/MP and IMS5600-DS/MP are particularly beneficial in alignment and positioning tasks in which a distance is to be measured and a thickness determined at the same time. Thanks to the absolute measurement, sampling is performed without signal loss.

Both models feature measuring range of 2,1 mm and a base distance of up to 19 mm. They provide up to 14 distance values or thickness measurement of up to 13 layers with minimal thickness of up to 10 µm and maximal thickness of up to 1,3 mm (BK7 type of glass).

IMS5400-DS/MP resolution is up to 1 nm, while its linearity for the first distance is less than ±50 nm and for further distances is less than ±150 nm. IMS5600-DS/MP boast resolution up to 30 pm and its linearity for first distance is less than ±10 nm and for further distances less than ±100 nm.

Maximum sensor tilt angle to the target is ±2°.

IMS5400-THxx/MP

With models IMS5400-TH70/MP and IMS5400-TH45/MP up to 5 individual layers or air gaps can be measured simultaneously, with minimal layer thickness being up to 35 µm and maximal thickness of up to 1,4 mm (BK7 type of glass). The resolution of both models is 1 nm.

Model IMS5400-TH45/MP features measuring range up to 7 mm, base distance up to 45 mm, linearity <±100 nm and maximal sensor tilt angle ±2°.

Model IMS5400-TH70/MP features measuring range up to 4,2 mm, base distance up to 70 mm, linearity <±200 nm and maximal sensor tilt angle ±4°. A large base distance offers process reliability and protects the sensor from damage.

Benefit from MP interferometers in various applications

Most common application of the multi-peak interferometers in industry is the one-sided multi-layer thickness measurement of thin layers, flat glass and films. They are used in the production of coated glass, batteries, plastic film, displays, LED and similar.

Also distance measurements are possible on many surfaces, e.g., glass, metals, films/coatings, lenses, and other. Systems for multi-peak distance measurement are therefore used in high-tech industries, like semiconductor and miniature microelectronic industry.

For their high resolution and linearity MP interferometers are often used in laboratories.

Check out some use cases

Thickness measurement of plastic films

With IMS5400-TH/MP the thickness values are detected with micrometer accuracy at a high measuring rate, even if the multi-layer film flutters slightly.

MP interferometers: Thicknes measurement of plastic films

Position measurement when fitting precision glass

With IMS5400-DS19/MP up to 5 layers or air gaps can be measured simultaneously in the inline thickness measurements of display glass.

MP interferometers: Position measurement when fitting precision glass

Multi-layer thickness measurement of display glass

The white light interferometers IMS5400-TH/MP impress with their high measurement stability in the inline thickness measurements of display glass.

MP interferometers: Multi-layer thickness measurement of display glass

Checking the mask position

Vacuum multi-peak model IMS5600-DS19/MP/VAC is used to align photomasks.

MP interferometers: Checking the mask position

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